Plasma Souces: Ferromagnetic Enhanced ICP
Plasma Sensors designs and builds custom ferromagnetic enhanced ICP sources, FMICP.
Our proprietary technology brings about unique combination of compactness, high power transfer efficiency and negligible DC bias and RF plasma potential.
FMICP operate in noble, atomic and molecular gas mixtures over wide range of gas pressure and RF power.
FMICP applications are: ion, electron or plasma sources for space propulsion and material treatment, remote plasma sources for
process control and diagnostics in commercial reactors, plasma sources for R&D and academic research.
FMICP is complemented with a high efficiency RF generator with auto-matching and display of the plasma power absorption.
High efficiency ICP source with adjustable plasma distribution. US Patent 8,444,870
High efficiency ICP source with adjustable plasma distribution. US Patent 8,444,870
This source reliably operates over wide range of gas pressure (1 mTorr - 10 Torr) and RF power
(15 W - 500 W).
Extremely low DC and RF plasma potentials. PSST 20, 0255004 (2011).
RF power supply
- 10 - 300 W power range
- High efficiency power conversion (> 70%)
- Internal auto-matching to the coupler
- Voltage boosting for the discharge ignition
- Protection against overload and plasma extinction
- Display of the plasma absorbed power CW, pulsed and modulated operation